Getting My Noohapou To Work
Getting My Noohapou To Work
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Remote spots: Static units are usually situated remotely, growing Price tag and decreasing overall procedure performance.
30% of its peak electric power usage, presenting our clients significant reduction in working costs and increased reliability.
The information below is classified by semiconductor procedure and Software maker. Every single desk includes an programs Matrix that displays qulified and business procedures.
Originally Started in 1985, our enterprise has developed into a recognized leader in offering temperature Handle methods to the global semiconductor field.
LAUDA-Noah will, for a shopper's retrofit evaluation, observe and alter its fluid temperature control profiles to match an present TCUs' as a way to ensure a smooth approach integration via DAQ.
We are guided in our belief that prosperity On this aggressive marketplace stems from supplying prospects with hugely engineered new merchandise and earth course customer service.
All static TCUs call for excess cooling & heating capacities because of their pretty substantial approach fluid reservoirs. the method fuid reservoir on LAUDA-Noah's dynamic temperature Command system is below 1 gallon.
With our device strategically mounted close to 6 feet within the chamber, we realize a way more correct examining from the chuck temperature. This strategy guarantees reliable temperature through the output large amount, resulting in improved wafer-to-wafer CD uniformity.
the information pertains to the 300mm chamber temperature profile for the duration of a superior aspect ratio Etch process, running at incredibly higher RF ability disorders (~3.8kW). The compelling aspects of this information established are:
LAUDA-Noah is Assembly these new issues and has incorporated Strength saving technologies in units which have been pleasant to your surroundings and possess a cheap to work.
The TEs' can switch directly from heating to cooling, or visa-versa. they might turn on & off even though within the heating or cooling method and may increase or minimize the amount of heating or cooling devoid of switching in any respect.
The POU3300 system presents dynamic temperature control of the process chamber cathode / electrode / anode and can be synchronized with any etch approach.
verified; TEs' represent only one Portion of a chiller's design and style. The switching & Command solutions utilized by a chiller will affect the TEs' dependability.
(thus, installing a static device next to chamber will not permit it to offer dynamic temperature Command)
We demand significantly less cooling/heating capability for the same software to be a static TCU check here as a result of our modest reservoir volume.
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